By Geckeler K.E., Nishide H. (eds.)
During this first accomplished compilation of evaluate chapters in this sizzling subject, greater than 30 specialists from worldwide offer in-depth chapters on their particular parts of craftsmanship, masking such crucial themes as:Block Copolymer structures, Nanofibers and NanotubesHelical Polymer-Based Supramolecular FilmsSynthesis of Inorganic NanotubesGold Nanoparticles and Carbon NanotubesRecent Advances in steel Nanoparticle-Attached ElectrodesOxidation Catalysis by way of Nanoscale Gold, Silver, and CopperConcepts in Self-AssemblyNanocompositesAmphiphilic Poly(Oxyalkylene)-AminesMesoporous AluminaNanoceramics for scientific ApplicationsEcological Toxicology of Engineered Carbon NanoparticlesMolecular ImprintingNear-Field Raman Imaging of Nanostructures and DevicesFullerene-Rich NanostructuresInteractions of Carbon Nanotubes with BiomoleculesNanoparticle-Cored Dendrimers and Hyperbranched PolymersNanostructured Organogels through Molecular Self-AssemblyStructural DNA NanotechnologyWith its insurance of all such vital parts as self-assembly, polymeric fabrics, bionanomaterials, nanotubes, photonic and environmental facets, this is often an important reference for fabrics scientists, engineers, chemists, physicists and biologists wishing to realize an in-depth wisdom of all of the disciplines concerned.
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For example, whilst a polystyryl lithium “macroinitiator” enables the rapid initiation of ethylene oxide, lithium-activated ethylene oxide will not efﬁciently initiate the polystyrene monomer and the reaction may not go to completion. This is due to the difference in relative reactivity between the oxyanion and carbanionic species. There are, of course, many advantages to anionic polymerizations, besides the fact that they produce polymers with the lowest polydispersity. One advantage is that the chain end can be terminated with functional groups or coupling agents to produce telechelic polymers or complex macromolecular architectures, respectively.
Adapted from Ref. . 2 Block Copolymers as Lithographic Materials which showed resolutions of 500 nm and etch rates which were 36-fold slower than hard-baked novalac . Gabor and coworkers attached a PDMS graft to the double bonds of an isoprene block in a styrene-block-isoprene BCP to create a negative-tone resist. In this way, Gabor et al. achieved line-space patterns of 200 nm using e-beam lithography, and demonstrated oxygen etching rates which were 42-fold slower than for polyimide .
Reprinted with permission from Ref. ; © 2006, American Association for the Advancement of Science. 12 The process ﬂow for MOS capacitors. (a) Polymer template formation on silicon surface; (b) RIE pattern transfer of PS template into silicon, followed by removal of the PS matrix; (c) SiO2 growth followed by top A1 gate electrode deposition; (d) SEM image at a 70° tilt after RIE etch. The remaining PS template is shown at the top. At the bottom, the nanoscale hexagonal array has been transferred into a Si counter electrode.